Osmium

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Osmium

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Orbitals and Energies #

Note – these are listed in BINDING ENERGY

 

Cu 2p ≈ 933 eV

Cu 2s ≈ 1096 eV

Cu 3s ≈ 120 eV

Cu 3p ≈ 74 eV

Cu metal by XPS: survey spectrum with peak markers
Cu metal by XPS: survey spectrum with peak markers

Doublet Separations #

Cu 2p = 19.8 eV

Cu 3p = 2.4 eV

Cu metal by XPS: Cu 2p region with overlapping peak markers
Cu metal by XPS: Cu 2p region with overlapping peak markers

Common Overlaps for Cu 2p #

I 3p – Pr 3d – Bi 4s – Sb 3s – Mn LMM (Al Ka X-rays)

Common Overlaps for Cu 3s #

Pr 4d – Nd 4d – Al 2s – Pm 4d – In 4s – Ge 3p – I 4p

Cu metal by XPS: Cu 2p region with overlapping peak markers
Cu metal by XPS: Cu 2p region with overlapping peak markers

Auger Energies #

Note – these are listed in KINETIC ENERGY

 

Cu LMM ≈ 570 eV

Cu LMM Augers and 2p core lines for metallic Cu

Common Binding Energies – Os 4f #

Species #

B.E. / eV #

Charge Ref #

Reference #

Os Metal

51

C 1s (284.8 eV)

OsO2

~ 54 eV

C 1s (284.8 eV)

Theory and Background #

  • Asymmetry in metallic lineshapes

    • Like Pt and Ir, metallic Os exhibits a strong Doniach–Šunjić asymmetry in its 4f peaks.

    • This makes fitting tricky — naïve Gaussian–Lorentzian fits tend to misassign oxidation states.

  • Multiple oxidation states overlapping

    • Os is “multi-valent” in oxides; you can have Os(IV), Os(VI), Os(VIII) present simultaneously.

    • Their 4f signals overlap closely (often <1 eV apart). Deconvolution is nontrivial and sometimes ambiguous.

  • Close overlap with Auger features

    • In certain cases, Os Auger lines can fall close to 4f binding energies, complicating background subtraction.

  • Surface oxidation / instability

    • Os is notorious for forming OsO₄ under even mild oxidative conditions.

    • This changes the XPS spectrum dramatically, and OsO₄ is volatile (and extremely toxic). Samples can “age” under air and show higher BE shoulders.

  • Peak width differences

    • Higher oxidation states of Os tend to broaden the 4f peaks compared to metallic Os.

    • This can look like unresolved multiplets, but it’s mostly due to chemical disorder and shake-up contributions.

Experimental Advice #

  • Minimise air exposure. Prepare samples in glovebox or under inert gas if possible; transfer under vacuum or with a sealed capsule.

  • Avoid heating in air. Thermal treatments can produce OsO₄ and change surface composition.

  • Surface cleanliness: Os is reactive — adventitious species (C/O) and thin oxide layers form quickly. Document handling history.

  • If you must sputter-clean, be careful: Common Ar⁺ sputtering tends to reduce Os oxides and can change oxidation states. Prefer low-energy sputtering or cluster-ion sputtering (gas-cluster, if available) and validate effects on reference samples first.

Data Analysis Guidance #

  • Always use asymmetric line shapes (e.g. Doniach–Šunjić) for metallic Os.

  • Constrain the 4f spin–orbit splitting (~2.9 eV) and area ratio (4f₇/₂ : 4f₅/₂ ≈ 4:3).

  • Be cautious when assigning oxidation states — Os(IV) vs Os(VI) differences can be <1 eV.

  • Cross-check with O 1s region (lattice vs oxide oxygen) and possibly XAS if available.

Reference Datasets #

 

Coming soon

References #

1. Li, Chunxiang, Weng Kee Leong, and Ziyi Zhong. “Metallic osmium and ruthenium nanoparticles for CO oxidation.” Journal of Organometallic Chemistry 694.15 (2009): 2315-2318.