Indium

View Categories

Indium

6 min read

Orbitals and Energies #

Note – these are listed in BINDING ENERGY

 

In 3s ≈ 830 eV

In 3p ≈ 665 eV

In 3d ≈ 444 eV

In 4s ≈ 123 eV

In 4p ≈ 78 eV

In 4d ≈ 17 eV

In 5p ≈ 1 eV

IGZO Survey With Peak Markers for In

Doublet Separations #

In 3d = 7.54 eV

In 4d  0.86 eV

In 3p = 37.9 eV

XPS of In 3d with doublet separation

Common Overlaps for In 3d #

Ti 2p – Er 4s – Re 4p – Bi 4d

In 3d Region With Overlapping Peak Markers

Auger Energies #

Note – these are listed in KINETIC ENERGY

 

In MNN ≈ 400 eV

XPS of In LMM Region

Common Binding Energies – Cu 2p #

Species #

B.E. / eV #

Charge Ref #

Reference #

In Metal

443.7

Au 4f (83.98 eV)

In2O3

444.7

C 1s (285 eV)

In(OH)3

445.1

C 1s (285 eV)

Theory and Background #

  • Plasmon-loss structure is prominent for metallic In. Expect distinct loss peaks on the high-BE side of the main line; an oft-cited separation for a strong plasmon loss in metallic In is ~11–12 eV from the main 3d₅/₂ (exact values vary with sample/geometry). These appear as satellite “replicas” and are not separate chemical states.[1]

  • Final-state screening & many-body tails: Metallic final states cause asymmetric main peaks with a high-BE tail; the asymmetry magnitude depends on conduction-electron density. Expect clear asymmetry for In⁰, weak/none for fully ionic In³⁺.

  • Intrinsic vs extrinsic losses: Besides intrinsic shake/plasmon satellites, extrinsic inelastic scattering adds a long high-BE background; a Tougaard-type background (rather than simple Shirley) often models this better, especially when metallic In is present.

Experimental Advice #

  • Preferential sputtering & chemical reduction: Ar⁺ sputtering preferentially removes oxygen from In oxides → oxygen-deficient InₓOᵧ or even metallic In⁰ at the surface, along with the growth of plasmon-loss structure and metallic asymmetry. If you must depth-profile oxides/ITO, lower energy, grazing incidence, or cluster sputtering can mitigate—but still monitor chemistry continuously.[2]

  • “Small-shift” problem: In 3d chemical shifts between In⁰, In₂O₃, and In(OH)₃ are sub-eV and frequently overlap across labs. Always acquire In MNN and compute α′ (or use a Wagner plot) to speciate robustly.

  • Thermal/handling quirks: Indium is soft and smears; ensure clean, firm mounting. Beware trace In foil contamination if you use it as a backing—its metallic 3d + plasmons can appear unexpectedly.

Data Analysis Guidance #

Use Tougaard (or mixed) backgrounds for metallic spectra to capture plasmon-loss tail; Shirley can underfit the high-BE side and falsely inflate “oxide” components.

Reference Datasets #

 

Coming soon

References #

1

Detweiler, Zachary M., et al. “The oxidation and surface speciation of indium and indium oxides exposed to atmospheric oxidants.” Surface Science 648 (2016): 188-195.

2

Shard, Alexander G., and Mark A. Baker. “Practical guides for x-ray photoelectron spectroscopy: Use of argon ion beams for sputter depth profiling and cleaning.” Journal of Vacuum Science & Technology A 42.5 (2024).